Precision Heating Stage-Product Center-Congtical Technology

TC3012

TC3012-TB Model Features: Offers multiple temperature-control modes with a temperature‑control accuracy of ±0.1°C; simultaneously displays both the setpoint and the actual temperature; features controllable heating rates and a maximum temperature of 350°C; the heating plate provides a large, uniformly heated surface area; boasts a simple, highly reliable design with all components treated for corrosion resistance; includes a sample‑lifting function and is compatible with samples of various sizes.

TC3016

TC3016 Model Features: The heating stage offers a larger footprint, enhancing the efficiency of thermal processing for high‑volume and large‑size substrates such as silicon wafers. Temperature ramping can be controlled via host‑computer software, with support for multi‑segment temperature profiles. The heating panel is coated with white high‑temperature ceramic paint, providing excellent temperature uniformity while making sample changes easier to observe and maintaining cleanliness. This model can be customized with options such as a non‑insulated cover, vacuum adsorption, or a push‑rod system.

High-temperature heating stage

High‑temperature heating stages are primarily used in aerospace and defense, metallurgy and metalworking, new energy and high‑temperature equipment, as well as research and specialized materials applications. Examples include high‑temperature curing of silica–alumina gels, sintering of phosphate‑based adhesives, curing of conductive adhesives on aluminum foil and nickel strips, curing of ceramic adhesives, and bonding of superconducting materials.

TC504-VA

A vacuum heating stage is a device that integrates vacuum‑environment control and precise temperature regulation, and is widely used in the semiconductor and electronics industries for wafer annealing, degassing during chip packaging, curing of electronic pastes, and high‑temperature stability testing of sensor components. In materials science, it is employed for the synthesis and heat treatment of nanomaterials, vacuum annealing following thin‑film deposition, and vacuum curing of composite materials, among other applications.

High-Low Temperature Stage

The high‑ and low‑temperature sample stage features a sealed, double‑walled chamber design that not only ensures efficient heat transfer but also maintains a stable, reliable vacuum environment, providing optimal experimental conditions for a wide range of applications. The viewing window allows researchers to monitor the sample’s status at any time. The user interface is straightforward, with an integrated display for easy parameter adjustment. This equipment delivers an exceptionally low‑vibration environment and superior temperature uniformity, making it well suited for constructing temperature‑controlled testing systems for precision instruments.

Large-Area Customized Heating Plate

Larger heating area, higher temperature uniformity, and improved surface flatness are required; it can be used in the semiconductor and liquid crystal display industries for the thermal processing of large‑size glass substrates.

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