Hall Effect Measurement Instrument
Project | Technical Specifications |
Standard sample | Semiconductor thin films (P‑type and N‑type) such as Si, SiC, ZnO, CaN, ITO, etc. |
Magnetic field strength | 0.6T |
Temperature range | RT |
Magnetic field stability | ±1% per year |
Output current | 100 nA to 500 mA |
Mobility | 2-10 cm²/V·s |
Resistivity | 10-5-10 Ωcm |
Carrier concentration | 108-102/cm3 |
Sample measurement dimensions | 10×10 mm to 20×20 mm, thickness 10 nm to 2 mm |
Test Standard | AsTm F76-1985 |
1. High-precision current source with output accuracy up to 0.1 µA, capable of measuring most semiconductor materials.
2. High-precision voltage source, with 24-bit ADC acquisition, achieving accuracy down to the microvolt level.
3. Reliable repeatability: Multi‑stage filtering in both hardware and software ensures more stable measurement data, guaranteeing that each experimental result is the average of multiple measurements.
4. Featuring a simple and elegant design, the instrument is easy to connect and operate. After configuring the sample information, users can initiate testing with a single click, simultaneously obtaining data on resistivity, carrier concentration, Hall coefficient, and sheet resistance.
5. Fast testing speed, supporting rapid switching of current and magnetic field directions, with data processing performed using the Van der Pauw method.














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