High-Low Temperature Thermoelectric Parameter Measurement System

It is widely used to measure the Seebeck coefficient and resistivity of bulk metal and semiconductor samples, as well as nano‑thin film samples. Thermoelectric materials are functional materials that directly convert thermal energy into electrical energy and vice versa. The Seebeck coefficient, resistivity, and thermal conductivity are the three primary parameters in thermoelectric material research. The TMS‑2 is extensively employed to determine the Seebeck coefficient and resistivity of metallic and semiconductor materials under both high‑ and low‑temperature conditions; test specimens may include bulk samples, wire‑shaped samples, and thermoelectric thin films with thicknesses ≥ 50 nm.
Technical Specifications Product Features Download Materials

Parameter type

Project

Technical Specifications

Capability Parameters

Programmed temperature repeatability

≤1%

Temperature-programming rate deviation

≤10%

Seebeck coefficient resolution

0.05 μV/K

Resistivity resolution

0.05μΩ2m

Relative error of the Seebeck coefficient

≤5%

Relative error of resistivity

≤7%

Test parameters

Sample size

Length (10–180) mm; width (3–5) mm; thickness ≥ (50) nm

Seebeck test range

8-5000uV/K

Resistivity test range

0.1–10^6 μΩ·m

Temperature parameter

Temperature range

-190℃~300℃

RT~300℃

Cooling method

Liquid nitrogen cooling

-

Heating method

Heating plate heating

Heating plate heating

Maximum cooling rate

-20K/min

Natural cooling

Maximum heating rate

15K/min

Other parameters

Environmental temperature uniformity

3K

Temperature control accuracy

±0.2K

Vacuum level requirement

≤1Pa

Vacuum volume

2L

Vacuum interface

KF25/KF16

1. Advanced dynamic measurement technology ensures accurate and reliable test data;

2. The device is compact and easy to use;

3. Faster temperature cycling and a wide temperature testing range;

4. User-friendly test interface, automated measurement, and capable of unattended operation;

5. Intelligent data storage and processing.

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