XRD Heating and Cooling Stage

It is intended for use in conjunction with XRD or large-scale synchrotron sources.

Technical Specifications Product Features Download Materials

Model number	TES120E-XRD	TT1300E-XRD
Cooling method	Semiconductor	None
Temperature range	-40℃ to 120℃	RT to 1300℃
Temperature resolution	0.1℃
Temperature control accuracy	±0.1℃
Maximum heating rate	50℃/min	100℃/min
Maximum cooling rate	-40℃/min	Natural cooling
Sample stage size	35*35mm	20*22mm
Appearance dimensions	12014042mm	18014060mm
Cavity net weight	1kg	2kg
Vacuum level	Atmosphere protection	Atmosphere protection

Precise and stable temperature control: wide adjustable temperature range (depending on model, –190°C to 1200°C), high‑accuracy temperature measurement, minimal temperature‑holding fluctuations, multiple thermal protection features, and adjustable heating and cooling rates.

Excellent diffraction compatibility: The ultra-thin window design ensures high X-ray transmittance, low background noise, and no interference with the optical path, thereby guaranteeing superior diffraction‑pattern quality.

In-situ dynamic testing: supports constant-temperature operation, programmed heating and cooling, and thermal cycling, enabling real-time monitoring of the temperature‑dependent evolution of the sample’s crystal structure.

Universal and convenient: compatible with mainstream XRD brands, accommodates a wide range of sample forms, and features simple assembly and disassembly—no complex instrument modifications required.

Safe and Easy to Operate: Equipped with multiple safety features, dedicated temperature-control software, and a modular design, it offers straightforward maintenance and is suitable for both research and industrial testing.

Optional environmental control: Can be equipped with vacuum and inert‑atmosphere modules to prevent sample oxidation, frost formation, and other interfering phenomena.